Patterned Nanomagnetic Films

Nano-fabrication technologies for patterned structures made from thin films are reviewed. A classification is made to divide the patterning technologies in two groups namely with and without the using a mask. The more traditional methods as well as a few new methods are discussed al in relation with the application. As mask less methods we discussed direct patterning with ions including FIB, nanopaterning with electron beams, interferometric laser annealing and ion beam induced chemical vapor deposition. The methods using masks are ion irradiation and projection, interference lithography, the use of pre-etched substrates and templates from diblock copolymers and imprint technologies. Also a few remarks are given concerning the magnetic properties of patterned films. Nanometer scale magnetic entities (nanoelements, nanodots, nanomagnets) form a fast growing new area of solid-state physics including the new fields of applications. Two of them are summarized namely media for ultra high-density recording and magnetic logic devices.